Comprehensive Gap Analysis of Cleanroom Characteristics in an ISO 14644-1 Class 7 Facility at Polibatam

Abstract

A clean room is an environment with strict control of air particles, temperature, humidity, pressure, and airflow to maintain production quality in the semiconductor industry. This study aims to analyze the suitability of clean room characteristics to the ISO 14644-1 Class 7 standard using the gap analysis method. Data were obtained through direct measurements using a particle counter, hot wire anemometer, airflow meter, and CPS airflow meter. The parameters analyzed included particle count, airflow velocity, temperature, relative humidity, and differential pressure, which were compared with the standard to determine the gap value and level of compliance. The results showed that the particle count and differential pressure met the standard, while the airflow distribution, temperature, and relative humidity still showed discrepancies. Improvements to the HVAC system, humidity control, air balancing, and regular maintenance of the HEPA filter are needed to improve clean room performance and ensure compliance with the ISO 14644-1 Class 7 standard. Keywords: Clean Room, Characteristic, ISO 14644-1, Gap Analysis, Semiconductor